ROUND LAB Mugwort Calming Mask

[Description]

Double-wave sheet cools and adds rich hydration to skin with its air hole structure.
Patented pine and CICA complex quickly calms sensitized skin.
Sonic-extracted ingredient from fallen pine needles powerfully soothes skin.
Triple Hyaluronic Acid provides rich and intensive hydrating care.

[Size] 1 sheet mask

[Direction]

  • Step 1 - Cleanse your face and apply toner to the skin.
  • Step 2 - Evenly apply the mask aligning with the eyes and lips.
  • Step 3 - Remove after 10 - 20 min. Gently massage and pat in remaining essence.

[Ingredients]

 Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum-1, Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside, Asiatic Acid, Madecassoside, Madecassic Acid, Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer